Properties of amorphous SiAlON thin films grown by RF magnetron co-sputtering

SiAlON thin films were deposited by RF magnetron co-sputtering of Al and Si targets in Ar/O2/N2 mixtures to a thickness of ~200nm onto both bare and Pt-coated r-cut sapphire substrates. Films deposited at 200°C are amorphous as determined from X-ray diffraction (XRD) and have

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Bibliographische Detailangaben
Veröffentlicht in:	Surface & coatings technology 2014-11, Vol.258, p.1191-1195
Hauptverfasser:	Bernhardt, G.P., Krassikoff, J.I., Sturtevant, B.T., Lad, R.J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous structure Applied sciences Corrosion Corrosion environments Cross-disciplinary physics: materials science rheology Deposition Exact sciences and technology High temperature oxidation Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Production techniques RF magnetron co-sputtering Sapphire SiAlON films Sialons Silicon substrates Stoichiometry Surface treatment Surface treatments Thin films Wear Wear resistance X-rays
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Beschreibung
Zusammenfassung:	SiAlON thin films were deposited by RF magnetron co-sputtering of Al and Si targets in Ar/O2/N2 mixtures to a thickness of ~200nm onto both bare and Pt-coated r-cut sapphire substrates. Films deposited at 200°C are amorphous as determined from X-ray diffraction (XRD) and have
ISSN:	0257-8972 1879-3347
DOI:	10.1016/j.surfcoat.2014.07.011