Magnetic field switching of cylindrical magnetron sputtering rates for coating glass fibers and rods

Abrupt switching of the sputtering rate in a cylindrical magnetron via changes in the longitudinal magnetic field has been investigated. The hollow cylindrical magnetron, equipped with an internal array of cylindrical-shaped coaxial anode grids, was employed to achieve a controllable modulation of the sputtering deposition rate via external variation of the longitudinal magnetic field though a critical field value. The rapid change of sputtering rate versus magnetic field allows for abrupt control of the sputter deposition rate of films on cylindrical rod or fiber substrate placed within the coaxial geometry.