Room temperature fabrication of highly textured hydrogen and tungsten co-doped ZnO film for solar cell applications

In this paper highly textured hydrogen and tungsten co-doped ZnO (HWZO) thin films were obtained through post-etching room temperature fabricated HWZO film. The influences of both the sputtering power and the working pressure on the structural and morphological properties e.g. light trapping of HWZO...

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Veröffentlicht in:	Solar energy materials and solar cells 2014-02, Vol.121, p.49-52
Hauptverfasser:	Wang, Yanfeng, Zhang, Xiaodan, Zhang, He, Huang, Qian, Yang, Fu, Meng, Xudong, Wei, Changchun, Zhao, Ying
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Direct energy conversion and energy accumulation Electrical engineering. Electrical power engineering Electrical power engineering Energy Exact sciences and technology H,W co-doped ZnO Light trapping Magnetron sputtering Natural energy Photoelectric conversion Photovoltaic cells Photovoltaic conversion Solar cells Solar cells. Photoelectrochemical cells Solar energy Solar power generation Thin film solar cells Thin films Tin dioxide Tin oxides Transparent conductive oxides Tungsten Zinc oxide
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Beschreibung
Zusammenfassung:	In this paper highly textured hydrogen and tungsten co-doped ZnO (HWZO) thin films were obtained through post-etching room temperature fabricated HWZO film. The influences of both the sputtering power and the working pressure on the structural and morphological properties e.g. light trapping of HWZO were systematically evaluated. Higher haze value and EQE for μc-Si:H solar cell showed that HWZO film possessed a uniform textured surface and enhanced light scattering compared to the commercial SnO2: F thin films.
ISSN:	0927-0248 1879-3398
DOI:	10.1016/j.solmat.2013.10.025