A simple method to produce dual-scale silicon surfaces for solar cells

In this paper, we report a simple method to produce micro/nano dual-scale textured silicon surfaces by combining alkaline etching with plasma surface processing. The surface morphologies were investigated by a field emission scanning electron microscope, while the surface reflectance and wettability were examined by a UV–VIS-NIR spectrophotometer and a drop shape analysis system, respectively. Results show that random nano-scale needle-like structures have been formed on micro-scale pyramids. The average reflectance and contact angle are 2.8% and ~120°, respectively. The solar cell based on the dual-scale textured silicon yields a high efficiency of 17.5% with a short circuit current density of 36.0mA/cm2. ► Produce dual-scale textured Si by alkaline etching and plasma surface processing. ► The average reflectance of the dual-scale textured Si is 2.8%. ► The contact angle of the dual-scale textured Si is ~120°. ► The solar cell based on the dual-scale textured Si yields efficiency of 17.5% with Jsc of 36.0mA/cm2.