Sputter deposition of SiC coating on silicon wafers

A study is conducted of the effect of substrate temperature during coating on the properties of coated SiC films on Si wafers, using a scratch test technique. While specimen temperature during coating has little effect on deposition rate, it significantly affects the durability of the coating. Scrat...

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Veröffentlicht in:	Scripta metallurgica et materialia 1992-09, Vol.27 (5), p.565-570
Hauptverfasser:	Robson, M.T, Blue, C.A, Warrier, S.G, Lin, R.Y
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Nonmetallic Materials Physical properties of thin films, nonelectronic Physics Solid surfaces and solid-solid interfaces Surface energy thermodynamic properties Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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Beschreibung
Zusammenfassung:	A study is conducted of the effect of substrate temperature during coating on the properties of coated SiC films on Si wafers, using a scratch test technique. While specimen temperature during coating has little effect on deposition rate, it significantly affects the durability of the coating. Scratch test damage to both film coating and substrate decreased with increasing deposition temperature, perhaps due to the rapid diffusion of the deposited atoms.
ISSN:	0956-716X
DOI:	10.1016/0956-716X(92)90341-B