Directed Growth of Electroactive Metal-Organic Framework Thin Films Using Electrophoretic Deposition

Directed Growth of Electroactive Metal-Organic Framework Thin Films Using Electrophoretic Deposition

Electrophoretic deposition (EPD) is used to assemble metal–organic framework (MOF) materials in nano‐ and micro‐particulate, thin‐film form. The flexibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU‐1000, UiO‐66, HKUST‐1, and Al‐MIL‐53. Additionally, EPD is us...

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Veröffentlicht in:Advanced materials (Weinheim) 2014-09, Vol.26 (36), p.6295-6300
Hauptverfasser: Hod, Idan, Bury, Wojciech, Karlin, David M., Deria, Pravas, Kung, Chung-Wei, Katz, Michael J., So, Monica, Klahr, Benjamin, Jin, Danni, Chung, Yip-Wah, Odom, Teri W., Farha, Omar K., Hupp, Joseph T.
Format: Artikel
Sprache:eng
Schlagworte:
Aluminum
Deposition
electrochemical
Electrophoretic deposition
Flexibility
Metal-organic frameworks
Nanostructure
Thin films
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Beschreibung
Zusammenfassung:Electrophoretic deposition (EPD) is used to assemble metal–organic framework (MOF) materials in nano‐ and micro‐particulate, thin‐film form. The flexibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU‐1000, UiO‐66, HKUST‐1, and Al‐MIL‐53. Additionally, EPD is used to pattern the growth of NU‐1000 thin films that exhibit full electrochemical activity.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201401940