Acclimation to Ozone Stress in Radish: Leaf Demography and Photosynthesis

Whole plant acclimation to ozone exposure in growth-chamber cultivated radish (Raphanus sativus L. cv. Cherry Belle) was investigated. The primary goal was to separate developmental from physiological ozone acclimation processes. Plants were grown for 37 days at two different lengths of ozone exposu...

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Veröffentlicht in:The New phytologist 1991-07, Vol.118 (3), p.417-423
Hauptverfasser: Held, A. A., Mooney, H. A., Gorham, James N.
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Sprache:eng
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Zusammenfassung:Whole plant acclimation to ozone exposure in growth-chamber cultivated radish (Raphanus sativus L. cv. Cherry Belle) was investigated. The primary goal was to separate developmental from physiological ozone acclimation processes. Plants were grown for 37 days at two different lengths of ozone exposure and a control treatment. After germination, seedlings were transplanted into controlled growth chambers and exposed to daytime (10 h) ozone (0.12 μl l-1) either on the next day (continuous ozone treatment) or three days later (intermediate treatment) and compared to a control (average ambient ozone concentration 0.01-0.02 μml l-1). Plants grown in ozone after transplanting accumulated considerably less biomass than the controls, but had higher dry weights than the intermediate treatment, implying an acclimation response. Photosynthetic capacity and nitrogen content of leaves decreased at high levels of ozone exposure resulting in an accelerated leaf senescence. No distinct leaf-level physiological acclimation to ozone exposure was seen based on gas exchange measurements. As an apparent compensatory response, plants exposed to ozone had higher leaf production rates than control plants, at the expense of root and hypocotyl growth. This developmental, whole-plant response appeared to be the most effective acclimation response to ozone exposure seen in radish. However, it did not fully compensate for the damage caused by ozone, since plants still showed considerable reductions in growth.
ISSN:0028-646X
1469-8137
DOI:10.1111/j.1469-8137.1991.tb00023.x