Initiated Chemical Vapor Deposition and Light-Responsive Cross-Linking of Poly(vinyl cinnamate) Thin Films

The first vapor‐phase deposition of poly(vinyl cinnamate) (PVCin) is reported. Initiated chemical vapor deposition (iCVD) is used to synthesize PVCin thin films with an average thickness of 100 nm. Free radical polymerization and cyclization reactions compete during the deposition process, with approximately 45% of the repeat units undergoing cyclization. Exposure to UV light (λ = 254 nm) induces dimerization (cross‐linking) of the PVCin, which is quantified using spectroscopic techniques. Approximately 90% of the free cinnamate moieties are dimerized at a UV dose of 300 mJ cm−2. PVCin is also incorporated into a copolymer with N‐isopropylacrylamide, which exhibits a characteristic change in hydrophilicity with temperature. The copolymer is selectively cross‐linked through a mask, and reversible swelling of patterns with 30 μm resolution is demonstrated by submerging the film in water. The first vapor‐phase deposition of photoresponsive poly(vinyl cinnamate) thin films is reported. Film compositions and extent of photodimerization (cross‐linking) are quantified using spectroscopic techniques, and a selectively exposed dual‐responsive copolymer of vinyl cinnamate and N‐isopropylacrylamide exhibits reversible patterning upon submersion in water.