Fabrication of Second Generation Replica Mold by Hybrid Polymer Material OrmostampTM

Fabrication of Second Generation Replica Mold by Hybrid Polymer Material OrmostampTM

OrmostampTM (Microresist technology GmbH) is a UV curable Silica based organic hybrid material and can be for hard substrates like e.g. quartz plates. In this report, fabrication of the 1-st and 2-nd generation replica mold from the OrmostampTM to OrmostampTM is addressed. Around 40nm lines with 20n...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2014/07/08, Vol.27(1), pp.95-98
Hauptverfasser: Noma, Hayato, Wang, Si, Uemura, Kimiaki, Shimomukai, Kazuma, Yasuda, Masaaki, Kawata, Hiroaki, Sheer, Hella-Christin, Hirai, Yoshihiko
Format: Artikel
Sprache:eng
Schlagworte:
Molds
nanoimprint
Photopolymers
Plates
Quartz
replica mold
second generation
Silicon dioxide
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Beschreibung
Zusammenfassung:OrmostampTM (Microresist technology GmbH) is a UV curable Silica based organic hybrid material and can be for hard substrates like e.g. quartz plates. In this report, fabrication of the 1-st and 2-nd generation replica mold from the OrmostampTM to OrmostampTM is addressed. Around 40nm lines with 20nm spaces are fairly transferred.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.27.95