A novel SOI MESFET by \(\uppi \) -shaped gate for improving the driving current
This paper introduces a novel silicon-on-insulator (SOI) metal-semiconductor field-effect transistor (MESFET) with \(\uppi \) -shaped gate with triple workfunction ( \(\uppi \) -SOI MESFET) to improve the DC and radio frequency characteristics. The DC and radio frequency characteristics of the propo...
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Veröffentlicht in: | Journal of computational electronics 2014-06, Vol.13 (2), p.562-568 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This paper introduces a novel silicon-on-insulator (SOI) metal-semiconductor field-effect transistor (MESFET) with \(\uppi \) -shaped gate with triple workfunction ( \(\uppi \) -SOI MESFET) to improve the DC and radio frequency characteristics. The DC and radio frequency characteristics of the proposed structure are analyzed by 2-D ATLAS international simulator and compared with a conventional SOI MESFET (C-SOI MESFET). The simulated results show that the proposed SOI MESFET has excellent effect on the breakdown voltage and the driving current. The breakdown voltage of the \(\uppi \) -SOI MESFET structure gets 54 % enhancement compared with that of the C-SOI MESFET structure and also the driving current of the \(\uppi \) -SOI MESFET structure gets 66.66 % enhancement compared with that of the C-SOI MESFET structure. Other main characteristics such as maximum output power density, maximum oscillation frequency and maximum available gain have been evaluated and improved in the proposed structure. |
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ISSN: | 1569-8025 1572-8137 |
DOI: | 10.1007/s10825-014-0569-9 |