Direct PECVD growth of vertically erected graphene walls on dielectric substrates as excellent multifunctional electrodes
A novel uniform multi-level matrix of vertically erected graphene walls is directly grown on a dielectric substrate by plasma enhanced chemical vapor deposition (PECVD) at 900 degree C without the presence of any catalyst and post-transfer treatment. Such a two-level structure is composed of continu...
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Veröffentlicht in: | Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2013-01, Vol.1 (3), p.770-775 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | A novel uniform multi-level matrix of vertically erected graphene walls is directly grown on a dielectric substrate by plasma enhanced chemical vapor deposition (PECVD) at 900 degree C without the presence of any catalyst and post-transfer treatment. Such a two-level structure is composed of continuous vertically erected graphene sheets (the second level) on a nanocrystalline graphene film (the first level). A nanocrystalline film is formed in the first stage ( |
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ISSN: | 2050-7488 2050-7496 |
DOI: | 10.1039/C2TA00234E |