Ultrasonic-assisted mist chemical vapor deposition of II-oxide and related oxide compounds

Basic concepts of ultrasonic‐assisted mist chemical vapor deposition (CVD), and its applications to the fabrication of II‐oxide and related oxide films are described. Fairly good thin film properties and device performance, compared to those achieved by conventional vacuum‐based processes, encourage...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Physica status solidi. C 2014-07, Vol.11 (7-8), p.1225-1228
Hauptverfasser:	Fujita, Shizuo, Kaneko, Kentaro, Ikenoue, Takumi, Kawaharamura, Toshiyuki, Furuta, Mamoru
Format:	Artikel
Sprache:	eng
Schlagworte:	Basic oxides Chemical vapor deposition Devices environmental friendly non-vacuum process Oxide coatings oxide thin films Oxides Solid state physics solution-based deposition Thin films
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Basic concepts of ultrasonic‐assisted mist chemical vapor deposition (CVD), and its applications to the fabrication of II‐oxide and related oxide films are described. Fairly good thin film properties and device performance, compared to those achieved by conventional vacuum‐based processes, encourage the mist CVD as a simple, inexpensive, energy‐saving and non‐vacuum process, opening new and wide application of oxide materials for novel devices supporting the future environment. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
ISSN:	1862-6351 1610-1642
DOI:	10.1002/pssc.201300655