High-yield fabrication of nm-size gaps in monolayer CVD graphene

Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95% for the gap...

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Veröffentlicht in:Nanoscale 2014-07, Vol.6 (13), p.7249-7254
Hauptverfasser: Nef, Cornelia, Pósa, László, Makk, Péter, Fu, Wangyang, Halbritter, András, Schönenberger, Christian, Calame, Michel
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Sprache:eng
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Zusammenfassung:Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95% for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.
ISSN:2040-3364
2040-3372
DOI:10.1039/c4nr01838a