Long-Range Ordered Self-Assembly of Novel Acrylamide-Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication

Novel acrylamide‐based hard‐soft hybrid block copolymers generate high‐quality nanolithographic patterns satisfying high‐resolution, long‐range ordering, low defect density, moderate etch selectivity, and easy pattern transfer onto a substrate. The resulting patterns can also be used as a scaffold f...

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Veröffentlicht in:	Advanced materials (Weinheim) 2014-05, Vol.26 (18), p.2894-2900
Hauptverfasser:	Lee, Je Gwon, Jung, Yeon Sik, Han, Sung-Hwan, Kim, Kwan-Mook, Han, Yang-Kyoo
Format:	Artikel
Sprache:	eng
Schlagworte:	Block copolymers Copolymers Density direct self-assembly metallic nanostructures nanolithography Nanostructure Nanowires novel diblock copolymers Regularity Scaffolds Self assembly
Online-Zugang:	Volltext
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