Long-Range Ordered Self-Assembly of Novel Acrylamide-Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication

Novel acrylamide‐based hard‐soft hybrid block copolymers generate high‐quality nanolithographic patterns satisfying high‐resolution, long‐range ordering, low defect density, moderate etch selectivity, and easy pattern transfer onto a substrate. The resulting patterns can also be used as a scaffold for metallic nanostructures such as aligned nanowires and nanomeshes with extraordinary structural regularity.