High efficiency silicon nitride grating coupler

In this paper, we have designed, fabricated and characterized silicon nitride grating couplers with high efficiency at 1490 nm. The devices are fabricated using deep UV photolithography with resolution requirement of ∼500 nm. The grating coupler fabricated yields a peak coupling efficiency of −5.1 d...

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Veröffentlicht in:	Applied physics. A, Materials science & processing Materials science & processing, 2014-04, Vol.115 (1), p.79-82
Hauptverfasser:	Zhang, Huijuan, Li, Chao, Tu, Xiaoguang, Luo, Xianshu, Yu, Mingbin, Lo, Patrick Guo-Qiang
Format:	Artikel
Sprache:	eng
Schlagworte:	Bandwidth Characterization and Evaluation of Materials Condensed Matter Physics Devices Invited Paper Joining Machines Manufacturing Materials science Nanotechnology Noise levels Optical and Electronic Materials Photolithography Physics Physics and Astronomy Processes Silicon nitride Surfaces and Interfaces Thin Films
Online-Zugang:	Volltext
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