Controlling of 6 nm Sized and 10 nm Pitched Dot Arrays Ordered along Narrow Guide Lines Using PS–PDMS Self-Assembly

We have studied graphoepitaxy to make nanodots or nanolines ordered along electron beam (EB)-drawn resist guide using block copolymers (BCPs) of polystyrene-polydimethylsiloxane (PS–PDMS). We found out that the number n of ordered molecular dot arrays in the line gap increases stepwise with the gap between guide lines. The n self-assembled dot arrays were ordered in a gap between n and n + 1 times the mean PDMS pitch and self-assembled with no guide pattern. According to the ordering characteristics, 6 nm sized and 10 nm pitched PDMS dot arrays were formed using the BCP self-assembly with the guide lines.