Fabrication of magnesium silicide thin films by pulsed ion beam ablation in a 1.6 kJ plasma focus device

The production of magnesium silicide (Mg2Si) thin films on silicon (1 0 0) at room temperature using a low energy (1.6 kJ) plasma focus device is reported. The conventional hollow copper anode is replaced by anode fitted with solid magnesium top and the deposition is done using different numbers of...

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Veröffentlicht in:	Vacuum 2013-08, Vol.94, p.57-63
Hauptverfasser:	Hosseinnejad, M.T., Ghoranneviss, Mahmood, Etaati, G. Reza, Shahgoli, Farhad
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic force microscopy Deposition Intermetallics Magnesium Magnesium silicide Microstructure Plasma focus Pulsed ion beam ablation Scanning electron microscopy Shot Silicides Thin films XRD
Online-Zugang:	Volltext
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