Electrodeposition of nickel on boron-doped diamond from an air-stable methyl sulphate anion based ionic liquid

•Electrodeposition of Ni was carried out in triethylmethylammonium methyl sulphate, a low cost and air-stable ionic liquid.•Electrodeposition of Ni (II) ions takes place slightly at more positive potential on the BDD when compared to the GC.•Highly dense Ni deposits with cracks are noted on the BDD, whereas, they are porous in the form of cauliflower on the GC.•BDD follows 3D instantaneous nucleation, however on GC, it is progressive, as confirmed from chronoamperometric studies. Electrodeposition of nickel had been successfully carried out for the first time in the ionic liquid triethylmethylammonium methyl sulphate (TEMAMS) on boron-doped diamond (BDD) along with glassy carbon electrode (GC). The electrochemical reduction of Ni (II) ions takes place slightly at a more positive potential on the BDD than the GC in this medium. The nickel deposition proceeds via three-dimensional instantaneous nucleation on the BDD and progressive on the GC. Surface morphologic characteristics of Ni deposits obtained on the BDD and GC at different deposition potentials were characterised by SEM and AFM.