High-quality fringe pattern generation using binary pattern optimization through symmetry and periodicity

This paper presents a novel method to construct binary patterns for high-quality 3D shape measurement. The algorithm generates small patches using symmetry and periodicity, randomly initializes each pixels, optimizes the small patches through mutations, and finally tiles the optimized patches into full size patterns using again symmetry and periodicity. We will demonstrate that the proposed method can achieve substantial phase quality improvements over the dithering techniques for different amounts of defocusing. •Novel method of constructing binary patterns for high-quality fringe generation at different amounts of defocusing.•Significantly increase the measurement quality of the binary defocusing at different amounts of defocusing.•Could drastically enhance the capability of the binary defocusing technique.