In-plane scattering patterns from a complex dielectric grating at the normal and oblique incidence

The in-plane scattering patterns from a complex dielectric grating were both numerically and experimentally studied in contrast to those from well-known metallic gratings. The incidence was the transverse electric or transverse magnetic wave of wavelength λ=660  nm. The grating profile was complex w...

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Veröffentlicht in:Journal of the Optical Society of America. A, Optics, image science, and vision Optics, image science, and vision, 2014-04, Vol.31 (4), p.879-885
Hauptverfasser: Chen, Yu-Bin, Ho, I-Chuan, Chiu, Feng-Cheng, Chang, Chia-Sheng
Format: Artikel
Sprache:eng
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Zusammenfassung:The in-plane scattering patterns from a complex dielectric grating were both numerically and experimentally studied in contrast to those from well-known metallic gratings. The incidence was the transverse electric or transverse magnetic wave of wavelength λ=660  nm. The grating profile was complex with a period Λ=7.0  μm, while the material was lightly doped crystalline silicon. Patterns of the electric field, magnetic field, and spatial intensity distribution were demonstrated at the normal (θ(i)=0°) and oblique (θ(i)=+30°) incidence. Electric and magnetic fields were presented in the near field as well as the far field. The measured power ratio within -90°≤θ(r)≤+90° was plotted. Their major peaks and the numerically obtained diffraction efficiency of 21 orders (-10≤m≤+10 or -15≤m≤+5) of diffracted waves occurred at the same θ(r). Other peaks and stair-like shoulders of major peaks also exhibited in spectra.
ISSN:1084-7529
1520-8532
DOI:10.1364/JOSAA.31.000879