Electrical determination of the diffusion barrier for gold in ZnTe

We report on the effect of Au diffusion on the electrical properties of ZnTe films deposited on Au coated substrates using rf magnetron sputtering. A drop over about 8 decades in the room temperature conductivity is observed for a change in substrate temperature from 60 °C to 325 °C. The results are...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2013-12, Vol.103 (23)
1. Verfasser: El Akkad, Fikry
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We report on the effect of Au diffusion on the electrical properties of ZnTe films deposited on Au coated substrates using rf magnetron sputtering. A drop over about 8 decades in the room temperature conductivity is observed for a change in substrate temperature from 60 °C to 325 °C. The results are interpreted in terms of a point-defect model that takes into account the interaction between the in-diffused Au and the intrinsic defects. The analysis of the results on the basis of this model yields a diffusion barrier of 0.40 eV for gold in ZnTe.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4838659