Dense Arrays of Highly Aligned Graphene Nanoribbons Produced by Substrate-Controlled Metal-Assisted Etching of Graphene

Dense arrays of aligned graphene nanoribbons (GNRs) are fabricated by substrate‐controlled etching of large‐area single‐layer graphene. An adequate choice of etching substrate and catalyst deposition method allows densities up to 25 nanoribbons μm–1 to be obtained with average widths of 19 nm. The efficacy of the method is evidenced by the high on/off ratios of back‐gated transistors made with these GNRs, which can go up to 5000.