Thin-film thickness-modulated designs for optical minus filter

We proposed an analytical method to design optical minus filters by the thickness modulation of discrete, homogeneous thin-film layers of a two-material multilayer coating. The main stack provides the narrow, second-order rejection band, and the correct thickness-modulation apodization and match lay...

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Veröffentlicht in:Applied optics (2004) 2013-08, Vol.52 (23), p.5788-5793
Hauptverfasser: Zhang, Jinlong, Xie, Yujiang, Cheng, Xinbin, Jiao, Hongfei, Wang, Zhanshan
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Sprache:eng
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Zusammenfassung:We proposed an analytical method to design optical minus filters by the thickness modulation of discrete, homogeneous thin-film layers of a two-material multilayer coating. The main stack provides the narrow, second-order rejection band, and the correct thickness-modulation apodization and match layers can effectively suppress the sidelobes of the passband. Using this approach, we can design minus filters with layer thicknesses close to half-wave of the rejection wavelength, making this method well suited for accurate monitoring during the deposition.
ISSN:1559-128X
2155-3165
1539-4522
DOI:10.1364/AO.52.005788