On the plasma uniformity of multi-electrode CCPs for large-area processing

In this work, we attempt to overcome the problem of non-uniformity of large-area capacitively coupled plasmas. We select a multi-electrode concept and construct a system with two concentric electrodes. In the two-circuit model, both electrodes have the same area. The plasma of this system is measured by a two-dimensional probe array. We measure the plasma in the large-area chamber that has the multi-electrode. We reduce the non-uniformity to almost 3% and investigate the conditions of a uniform plasma.