Arsonic Acid Self-Assembled Monolayers Protect Oxide Surfaces from Micronewton Nanomechanical Forces

The development of new surface coatings is critical for combating wear and increasing the device lifetime in microelectromechanical systems (MEMS). Here, a class of arsonic acid self‐assembled monolayers (SAMs) is reported that form readily on oxide substrates including silicon oxide, borosilicate glass, and titanium oxide. Monolayers are easily prepared using a straightforward soaking technique, which is amenable to large‐scale commercial applications. Monolayer formation on borosilicate glass and titanium oxide is characterized using infrared spectroscopy. Monolayers on borosilicate glass, native silicon oxide and titanium oxide are evaluated with contact angle measurements, as well as wear measurements using nanoscratching experiments. On titanium oxide and borosilicate glass, monolayers prepared from hexadecylarsonic acid provide significantly greater surface protection than surfaces reacted under similar conditions with hexadecylphosphonic acid, a common modifying agent for oxide substrates. Hexadecylarsonic acid self‐assembled monolayers are prepared on glass, silicon oxide, and titanium oxide via a straight‐forward soaking method. These monolayers protect the substrates from micronewton mechanical forces applied in scanning probe microscopy nanoscratching experiments. Compared to hexadecylphosphonic acid, the arsonate shows increased reactivity and greater protection of the substrate from mechanical stress. This system shows excellent potential as a microelectromechanical systems (MEMS) lubricant.