Influence of Hydrogen Plasma on the Defect Passivation of Polycrystalline Si Thin Film Solar Cells

Hydrogen passivation (HP) of polycrystalline silicon (poly‐Si) thin film solar cells was performed in a parallel plate radio‐frequency (rf) plasma setup. The influence of hydrogen pressure p and electrode gap d on breakdown voltage Vbrk is presented showing that the minimum in Vbrk shifts with higher pressures towards higher p · d values. Cell test structures provided by CSG Solar AG were used to examine the influence of p and d on the open circuit voltage VOC. The highest VOC's were achieved for p · d values that correspond to a minimum in Vbrk. HP strongly improved the VOC. After the hydrogen plasma treatment the VOC improved significantly by a factor of 2 and amounted to 450 mV. Optimized parameters were then applied to different poly‐Si solar cells prepared by electron beam evaporation.