Nanosecond laser pulse induced vertical movement of thin gold films on silicon determined by a modified Michelson interferometer

The vertical movement of a 40 nm thin Au film on a silicon substrate during intense nanosecond (ns) laser irradiation is determined on the nm vertical and ns time scales using an optimized Michelson interferometer. The balanced setup with two detectors uses the inverse interference signal and accoun...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics. A, Materials science & processing Materials science & processing, 2013-02, Vol.110 (2), p.321-327
Hauptverfasser: Kneier, F., Geldhauser, T., Scheer, E., Leiderer, P., Boneberg, J.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The vertical movement of a 40 nm thin Au film on a silicon substrate during intense nanosecond (ns) laser irradiation is determined on the nm vertical and ns time scales using an optimized Michelson interferometer. The balanced setup with two detectors uses the inverse interference signal and accounts for transient reflectivity changes during irradiation. We show that a change in phase shift upon reflection must be taken into account to gain quantitative results. Three distinct fluence regimes can be distinguished, characterized by transient reflectivity behavior, dewetting processes and film detachment. Maximum displacement velocities are determined to be 0.6 m/s and 1.9 m/s below and above the melting threshold of the metal, respectively. Flight velocities of detaching liquid films are found to be between 30 and 70 m/s for many nanoseconds.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-012-7235-5