Laser-induced forward transfer of intact chalcogenide thin films: resultant morphology and thermoelectric properties

We present a laser-based transfer method for the novel application of fabricating elements for planar thermoelectric devices. Thin films of thermoelectric chalcogenides (Bi 2 Te 3 , Bi 2 Se 3 and Bi 0.5 Sb 1.5 Te 3 ) were printed via laser-induced forward transfer (LIFT) onto polymer-coated substrat...

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Veröffentlicht in:Applied physics. A, Materials science & processing Materials science & processing, 2013-09, Vol.112 (4), p.1073-1079
Hauptverfasser: Feinaeugle, M., Sones, C. L., Koukharenko, E., Gholipour, B., Hewak, D. W., Eason, R. W.
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Sprache:eng
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Zusammenfassung:We present a laser-based transfer method for the novel application of fabricating elements for planar thermoelectric devices. Thin films of thermoelectric chalcogenides (Bi 2 Te 3 , Bi 2 Se 3 and Bi 0.5 Sb 1.5 Te 3 ) were printed via laser-induced forward transfer (LIFT) onto polymer-coated substrates over large areas of up to ∼15 mm 2 in size. A morphological study showed that it was possible to partially preserve the polycrystalline structure of the transferred films. The films’ Seebeck coefficients after LIFT transfer were measured and resulted in −49±1 μV/K, −93±8 μV/K and 142±3 μV/K for Bi 2 Te 3 , Bi 2 Se 3 and Bi 0.5 Sb 1.5 Te 3 , respectively, which were found to be ∼23±6 % lower compared to their initial values. This demonstration shows that LIFT is suitable to transfer sensitive, functional semiconductor materials over areas up to ∼15 mm 2 with minimal damage onto a non-standard polymer-coated substrate.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-012-7491-4