Effect of acetic acid on the performance of solution-processed gallium doped indium oxide thin film transistors

We investigated a role of acetic acid for solution processed gallium doped indium oxide thin film transistors (TFTs). By adding acetic acid in solution instead of commonly used ethanolamine, electrical performance of GIO TFTs is significantly enhanced. We demonstrated that acetic acid plays a role i...

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Veröffentlicht in:Journal of sol-gel science and technology 2013-07, Vol.67 (1), p.130-134
Hauptverfasser: Park, Jee Ho, Yoo, Young Bum, Lee, Keun Ho, Han, Sun Woong, Choi, Won Jin, Baik, Hong Koo
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Sprache:eng
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Zusammenfassung:We investigated a role of acetic acid for solution processed gallium doped indium oxide thin film transistors (TFTs). By adding acetic acid in solution instead of commonly used ethanolamine, electrical performance of GIO TFTs is significantly enhanced. We demonstrated that acetic acid plays a role in enhancing crystallinity, lowering decomposition temperature and reducing hydroxyl groups in the film. The GIO TFTs formed from acetic acid added solution have mobility of 12.68 cm 2  V −1  s −1 , threshold voltage of −7.4 V, on/off current ratio of 1.07 × 10 8 and subthreshold slope of 0.78 V/decade.
ISSN:0928-0707
1573-4846
DOI:10.1007/s10971-013-3058-x