Microwave-assisted seeded growth of the submicrometer-thick and pure b-oriented MFI zeolite films using an ultra-dilute synthesis solution

Microwave-assisted seeded growth of the submicrometer-thick and pure b-oriented MFI zeolite films using an ultra-dilute synthesis solution

A chitosan layer is utilized for controlled fabrication of MFI zeolite films in dilute synthesis solution under microwave irradiation. The dense, ca.600 nm-thick and solely b-oriented silicalite-1 films can be formed onto the chitosan supported silicalite-1 monolayer under microwave irradiation for...

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Veröffentlicht in:CrystEngComm 2013-01, Vol.15 (32), p.6301-6304
Hauptverfasser: Wang, Chaozheng, Liu, Xiufeng, Li, Jian, Zhang, Baoquan
Format: Artikel
Sprache:eng
Schlagworte:
Chitosan
Dilution
Irradiation
MFI
Microwaves
Monolayers
Synthesis
Zeolites
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Zusammenfassung:A chitosan layer is utilized for controlled fabrication of MFI zeolite films in dilute synthesis solution under microwave irradiation. The dense, ca.600 nm-thick and solely b-oriented silicalite-1 films can be formed onto the chitosan supported silicalite-1 monolayer under microwave irradiation for 1 h.
ISSN:1466-8033
1466-8033
DOI:10.1039/c3ce40644j