Helical edge resistance introduced by charge puddles

We study the influence of electron puddles created by doping of a 2D topological insulator on its helical edge conductance. A single puddle is modeled by a quantum dot tunnel coupled to the helical edge. It may lead to significant inelastic backscattering within the edge because of the long electron...

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Veröffentlicht in:Physical review letters 2013-05, Vol.110 (21), p.216402-216402, Article 216402
Hauptverfasser: Väyrynen, Jukka I, Goldstein, Moshe, Glazman, Leonid I
Format: Artikel
Sprache:eng
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Zusammenfassung:We study the influence of electron puddles created by doping of a 2D topological insulator on its helical edge conductance. A single puddle is modeled by a quantum dot tunnel coupled to the helical edge. It may lead to significant inelastic backscattering within the edge because of the long electron dwelling time in the dot. We find the resulting correction to the perfect edge conductance. Generalizing to multiple puddles, we assess the dependence of the helical edge resistance on the temperature and doping level and compare it with recent experimental data.
ISSN:0031-9007
1079-7114
DOI:10.1103/PhysRevLett.110.216402