Microstructural and functional stability of large-scale SnO2:F thin film with micro-nano structure

► The large-scale uniform SnO2:F film was prepared by APCVD on an industrial line. ► The SnO2:F film presented a micro-nano structure. ► The film showed uniform morphology and stable functional property under 580°C. ► ‘H’ factor was defined to quantify the structural influence on the low-e property....

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Journal of alloys and compounds 2013-02, Vol.550, p.144-149
Hauptverfasser:	Gao, Q., Li, M., Li, X., Liu, Y., Song, C.L., Wang, J.X., Liu, Q.Y., Liu, J.B., Han, G.R.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electrical properties of specific thin films Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Exact sciences and technology Fluorine-doped tin oxide Glass Grain boundaries Grains Homogeneous Low-emission glass Materials science Methods of deposition of films and coatings film growth and epitaxy Micro-nano structure Microstructure Nanostructure Other inorganic semiconductors Physics Stability Thin films Tin dioxide Tin oxides
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	► The large-scale uniform SnO2:F film was prepared by APCVD on an industrial line. ► The SnO2:F film presented a micro-nano structure. ► The film showed uniform morphology and stable functional property under 580°C. ► ‘H’ factor was defined to quantify the structural influence on the low-e property. The large-scale homogeneous fluorine-doped tin oxide (SnO2:F) thin film was successfully deposited on glass by atmospheric pressure chemical vapor deposition (APCVD) method on an industrial production line. XRD, SEM and TEM were employed to investigate the film morphological and microstructural variation. It was observed for the first time that the as-deposited SnO2:F thin film presented a typical micro-nano structure, of which the micro-sized grains (100–300nm) were assembled by nano-sized crystallites (
ISSN:	0925-8388 1873-4669
DOI:	10.1016/j.jallcom.2012.09.119