The influence of the photoacid-generator structure on chemical amplification in a resist

The influence of the photoacid-generator structure on chemical amplification in a resist

The effect of structure of a photoacid generator (triarylsulfonium and diaryliodonium salts) on the trends of image formation in a chemically amplified resist based on a methyl methacrylate copolymer with methacrylic acid and ethoxyethyl methacrylate was studied. It was shown that the type and quali...

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Veröffentlicht in:Polymer science. Series A, Chemistry, physics Chemistry, physics, 2006-03, Vol.48 (3), p.266-271
Hauptverfasser: Bulgakova, S. A., Dzhons, M. M., Mazanova, L. M., Lopatin, A. Ya
Format: Artikel
Sprache:eng
Schlagworte:
Amplification
Copolymers
Generators
Methacrylic acid
Polymethyl methacrylates
Resists
Trends
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Zusammenfassung:The effect of structure of a photoacid generator (triarylsulfonium and diaryliodonium salts) on the trends of image formation in a chemically amplified resist based on a methyl methacrylate copolymer with methacrylic acid and ethoxyethyl methacrylate was studied. It was shown that the type and quality of image in the resist depend on the structure of the Bronsted acid produced upon UV irradiation, on postexposure bake temperature, and on exposure radiation energy.
ISSN:0965-545X
1555-6107
DOI:10.1134/S0965545X06030072