Formation of Radiation-Induced Defects in Silica Glasses at High Irradiation Temperatures
The mechanisms of formation of radiation-induced defects in silica glasses are investigated under both simultaneous and sequential exposure to γ-radiation and high temperatures. It is demonstrated that silica glasses contain E"(T) centers (T = Si and Al) in impurity-free regions andE"^sub...
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Veröffentlicht in: | Glass physics and chemistry 2003-01, Vol.29 (1), p.11-15 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | The mechanisms of formation of radiation-induced defects in silica glasses are investigated under both simultaneous and sequential exposure to γ-radiation and high temperatures. It is demonstrated that silica glasses contain E"(T) centers (T = Si and Al) in impurity-free regions andE"^sub M^ (T) centers in the vicinity of alkali metal impurities. These centers can undergo transformations. The origin of a new center responsible for the absorption band at 360 nm is elucidated. This center is identified as a twofold-coordinated aluminum atom with a trapped electron.[PUBLICATION ABSTRACT] |
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ISSN: | 1087-6596 1608-313X |
DOI: | 10.1023/A:1022349524240 |