Modified Šolc notch filter for deep ultraviolet applications
We present results of the design and testing of a modified optical Šolc notch filter for use in the deep ultraviolet (DUV, 190-300 nm) spectral range. The filter was designed to block a specific wavelength in this region. In addition, a sequence of blocked wavelengths occurs at wavelengths both shor...
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Veröffentlicht in: | Applied Optics 2009-02, Vol.48 (6), p.1184-1189 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | We present results of the design and testing of a modified optical Šolc notch filter for use in the deep ultraviolet (DUV, 190-300 nm) spectral range. The filter was designed to block a specific wavelength in this region. In addition, a sequence of blocked wavelengths occurs at wavelengths both shorter and longer than the specified wavelength. For Raman applications utilizing tunable lasers, the provision of multiple blocked wavelengths by a single filter may be especially useful. The filter design presented here produces extinction ratios >240 with transmission minima ~1 nm full width at half-maximum. Specific results are shown for the Raman spectra of Teflon excited at 248.4 nm. |
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ISSN: | 1559-128X 0003-6935 1539-4522 |
DOI: | 10.1364/AO.48.001184 |