Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength
Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (
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| Veröffentlicht in: | Optics letters 2012-12, Vol.37 (24), p.5100-5102 |
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| container_end_page | 5102 |
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| container_issue | 24 |
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| container_title | Optics letters |
| container_volume | 37 |
| creator | Overbuschmann, Johannes Hengster, Julia Irsen, Stephan Wilhein, Thomas |
| description | Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes ( |
| doi_str_mv | 10.1364/OL.37.005100 |
| format | Article |
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Fabricating these zone plates is challenging due to small structure sizes (<150 nm) and complex nanostructuring processes. Fabrication techniques such as electron-beam lithography followed by etching and electroplating processes have been developed over the years. We are reporting on the development of a technique incorporating focused gallium ion-beam lithography to fabricate Fresnel zone plates with 120 nm outermost structure size in a process that combines pattern exposure and structure transfer in one single step. 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Fabricating these zone plates is challenging due to small structure sizes (<150 nm) and complex nanostructuring processes. Fabrication techniques such as electron-beam lithography followed by etching and electroplating processes have been developed over the years. We are reporting on the development of a technique incorporating focused gallium ion-beam lithography to fabricate Fresnel zone plates with 120 nm outermost structure size in a process that combines pattern exposure and structure transfer in one single step. The fabricated zone plates were successfully applied in a microscopic setup at λ=13 nm wavelength.</description><subject>Electron beam lithography</subject><subject>Fresnel zones</subject><subject>Ion beams</subject><subject>Lithography</subject><subject>Nanostructure</subject><subject>Plates</subject><subject>Wavelengths</subject><subject>Zone plates</subject><issn>0146-9592</issn><issn>1539-4794</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNqFkb1OIzEUha0VqyWw21EjlxRM8M-Mf0qENoAUKQ1bjzzOHWLkGQ-2E8i-Bz3PwpMxUYCW6hbnO0c69yB0QsmUclFeLOZTLqeEVJSQH2hCK66LUuryAE0ILUWhK80O0VFKD4QQITn_hQ4ZZ5UiVE3Qy8w00VmTXehxaPEsQurB4_-hBzx4kyHhZotHtWjAdNi7vAr30QyrLTb9Epth8J92k3BoHsBmtwHsoU-j1_UYnnOEDvDa52g2LnjIuHM2hmTDMKZkTPnba9_hJ7OB0XafV7_Rz9b4BH8-7jH6N_t7d3VTzBfXt1eX88JyIXMBVuiyNVpp02jJKNEVa1qpJGXWjmXFqGhFjFDNsq2AgaiU4pJoxltWUsqP0dk-d4jhcQ0p151LFrw3PYR1qikfP8UqwcrvUSZ5Sbhiu9TzPbrrmCK09RBdZ-K2pqTebVYv5jWX9X6zET_9SF43HSy_4M-R-Dver5NL</recordid><startdate>20121215</startdate><enddate>20121215</enddate><creator>Overbuschmann, Johannes</creator><creator>Hengster, Julia</creator><creator>Irsen, Stephan</creator><creator>Wilhein, Thomas</creator><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20121215</creationdate><title>Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength</title><author>Overbuschmann, Johannes ; Hengster, Julia ; Irsen, Stephan ; Wilhein, Thomas</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c367t-ec694fa989ab97210952bf78712cc0066989980a68bdf5e2e6588370923f24113</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Electron beam lithography</topic><topic>Fresnel zones</topic><topic>Ion beams</topic><topic>Lithography</topic><topic>Nanostructure</topic><topic>Plates</topic><topic>Wavelengths</topic><topic>Zone plates</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Overbuschmann, Johannes</creatorcontrib><creatorcontrib>Hengster, Julia</creatorcontrib><creatorcontrib>Irsen, Stephan</creatorcontrib><creatorcontrib>Wilhein, Thomas</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Optics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Overbuschmann, Johannes</au><au>Hengster, Julia</au><au>Irsen, Stephan</au><au>Wilhein, Thomas</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength</atitle><jtitle>Optics letters</jtitle><addtitle>Opt Lett</addtitle><date>2012-12-15</date><risdate>2012</risdate><volume>37</volume><issue>24</issue><spage>5100</spage><epage>5102</epage><pages>5100-5102</pages><issn>0146-9592</issn><eissn>1539-4794</eissn><abstract>Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (<150 nm) and complex nanostructuring processes. Fabrication techniques such as electron-beam lithography followed by etching and electroplating processes have been developed over the years. We are reporting on the development of a technique incorporating focused gallium ion-beam lithography to fabricate Fresnel zone plates with 120 nm outermost structure size in a process that combines pattern exposure and structure transfer in one single step. The fabricated zone plates were successfully applied in a microscopic setup at λ=13 nm wavelength.</abstract><cop>United States</cop><pmid>23258018</pmid><doi>10.1364/OL.37.005100</doi><tpages>3</tpages></addata></record> |
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| ispartof | Optics letters, 2012-12, Vol.37 (24), p.5100-5102 |
| issn | 0146-9592 1539-4794 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_1323225624 |
| source | Optica Publishing Group Journals |
| subjects | Electron beam lithography Fresnel zones Ion beams Lithography Nanostructure Plates Wavelengths Zone plates |
| title | Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength |
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