Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength

Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength

Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (

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Veröffentlicht in:Optics letters 2012-12, Vol.37 (24), p.5100-5102
Hauptverfasser: Overbuschmann, Johannes, Hengster, Julia, Irsen, Stephan, Wilhein, Thomas
Format: Artikel
Sprache:eng
Schlagworte:
Electron beam lithography
Fresnel zones
Ion beams
Lithography
Nanostructure
Plates
Wavelengths
Zone plates
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Beschreibung
Zusammenfassung:Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.37.005100