High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head
This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produce...
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Veröffentlicht in: | Applied physics letters 2012-10, Vol.101 (16) |
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Hauptverfasser: | , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.4760263 |