High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head

This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produce...

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Veröffentlicht in:Applied physics letters 2012-10, Vol.101 (16)
Hauptverfasser: Kim, Taeseob, Lee, Won-Sup, Joe, Hang-Eun, Lim, Geon, Choi, Guk-Jong, Gang, Myeong-Gu, Kang, Sung-Mook, Park, Kyoung-Su, Min, Byung-Kwon, Park, Young-Pil, Park, No-Cheol
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Sprache:eng
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Zusammenfassung:This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4760263