Removal of amorphous C and Sn on Mo:Si multilayer mirror surface in Hydrogen plasma and afterglow

Removal of amorphous C and Sn on Mo:Si multilayer mirror surface in Hydrogen plasma and afterglow

Removal of amorphous carbon and tin films from a Mo:Si multilayer mirror surface in a hydrogen plasma and its afterglow is investigated. In the afterglow, the mechanism of Sn and C films removal is solely driven by hydrogen atoms (radicals). Probabilities of Sn and C atoms removal by H atoms were me...

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Veröffentlicht in:Journal of applied physics 2012-05, Vol.111 (9), p.093304-093304-4
Hauptverfasser: Braginsky, O. V., Kovalev, A. S., Lopaev, D. V., Malykhin, E. M., Rakhimova, T. V., Rakhimov, A. T., Vasilieva, A. N., Zyryanov, S. M., Koshelev, K. N., Krivtsun, V. M., van Kaampen, Maarten, Glushkov, D.
Format: Artikel
Sprache:eng
Schlagworte:
Afterglows
Carbon
Flux
Hydrogen atoms
Hydrogen plasma
Multilayers
Radicals
Tin
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Zusammenfassung:Removal of amorphous carbon and tin films from a Mo:Si multilayer mirror surface in a hydrogen plasma and its afterglow is investigated. In the afterglow, the mechanism of Sn and C films removal is solely driven by hydrogen atoms (radicals). Probabilities of Sn and C atoms removal by H atoms were measured. It was shown that the radical mechanism is also dominant for Sn atoms removal in the hydrogen plasma because of the low ion energy and flux. Unlike for Sn, the removal mechanism for C atoms in the plasma is ion-stimulated and provides a much higher removal rate.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4709408