Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography

The synthesis of a two-stage photobase generator (PBG) based on photoinduced aromatization is described. This material was designed for use in resolution-enhanced photolithography. Computer modeling predicts that a delay in the onset of base generation can lead to improved image quality. This delay can be realized by a PBG that must undergo two sequential photoreactions for each molecule of base generated. Toward that end, latent PBGs were designed that are oxime esters of aliphatic acids, which undergo Norrish type II reactions to yield oxime esters of aromatic acids that are efficient PBGs.