Deposition of high-resolution Carbon/Carbon multilayers on large areas for X-ray optical applications
To synthesize X-ray optical multilayers showing both high resolution and high reflectivity spacer and absorber materials with low absorption coefficients for the desired spectral range are required. Simulations of C/C multilayers with different period thicknesses, d, and single layer densities, {/co...
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Veröffentlicht in: | Applied physics. A, Materials science & processing Materials science & processing, 2004-09, Vol.79 (4-6), p.1039-1042 |
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creator | MENZEL, M WEISSBACH, D GAWLITZA, P DIETSCH, R LESON, A |
description | To synthesize X-ray optical multilayers showing both high resolution and high reflectivity spacer and absorber materials with low absorption coefficients for the desired spectral range are required. Simulations of C/C multilayers with different period thicknesses, d, and single layer densities, {/content/TMYNX9YD45ALUVEM/xxlarge1009.gif}, show that a reflectance R{/content/TMYNX9YD45ALUVEM/xxlarge8201.gif}([Cu]K{/content/TMYNX9 Y D45ALUVEM/xxlarge945.gif})>80% and a resolving power of about {/content/TMYNX9YD45ALUVEM/xxlarge955.gif}/{/content/TMYNX9YD45ALU V EM/xxlarge916.gif}{/content/TMYNX9YD45ALUVEM/xxlarge955.gif}{/cont e n t/TMYNX9YD45ALUVEM/xxlarge8776.gif}600 can be achieved for C/C layer stacks with d=3 nm and N=1000 periods. |
doi_str_mv | 10.1007/s00339-003-2623-5 |
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A, Materials science & processing</title><description>To synthesize X-ray optical multilayers showing both high resolution and high reflectivity spacer and absorber materials with low absorption coefficients for the desired spectral range are required. 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A, Materials science & processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>MENZEL, M</au><au>WEISSBACH, D</au><au>GAWLITZA, P</au><au>DIETSCH, R</au><au>LESON, A</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deposition of high-resolution Carbon/Carbon multilayers on large areas for X-ray optical applications</atitle><jtitle>Applied physics. A, Materials science & processing</jtitle><date>2004-09-01</date><risdate>2004</risdate><volume>79</volume><issue>4-6</issue><spage>1039</spage><epage>1042</epage><pages>1039-1042</pages><issn>0947-8396</issn><eissn>1432-0630</eissn><abstract>To synthesize X-ray optical multilayers showing both high resolution and high reflectivity spacer and absorber materials with low absorption coefficients for the desired spectral range are required. Simulations of C/C multilayers with different period thicknesses, d, and single layer densities, {/content/TMYNX9YD45ALUVEM/xxlarge1009.gif}, show that a reflectance R{/content/TMYNX9YD45ALUVEM/xxlarge8201.gif}([Cu]K{/content/TMYNX9 Y D45ALUVEM/xxlarge945.gif})>80% and a resolving power of about {/content/TMYNX9YD45ALUVEM/xxlarge955.gif}/{/content/TMYNX9YD45ALU V EM/xxlarge916.gif}{/content/TMYNX9YD45ALUVEM/xxlarge955.gif}{/cont e n t/TMYNX9YD45ALUVEM/xxlarge8776.gif}600 can be achieved for C/C layer stacks with d=3 nm and N=1000 periods.</abstract><cop>Berlin</cop><pub>Springer</pub><doi>10.1007/s00339-003-2623-5</doi><tpages>4</tpages></addata></record> |
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subjects | Carbon Cross-disciplinary physics: materials science rheology Density Deposition Exact sciences and technology Laser deposition Materials science Methods of deposition of films and coatings film growth and epitaxy Multilayers Physics Reflectivity Resolution Spectra X-rays |
title | Deposition of high-resolution Carbon/Carbon multilayers on large areas for X-ray optical applications |
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