Deposition of high-resolution Carbon/Carbon multilayers on large areas for X-ray optical applications
To synthesize X-ray optical multilayers showing both high resolution and high reflectivity spacer and absorber materials with low absorption coefficients for the desired spectral range are required. Simulations of C/C multilayers with different period thicknesses, d, and single layer densities, {/co...
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Veröffentlicht in: | Applied physics. A, Materials science & processing Materials science & processing, 2004-09, Vol.79 (4-6), p.1039-1042 |
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Sprache: | eng |
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Zusammenfassung: | To synthesize X-ray optical multilayers showing both high resolution and high reflectivity spacer and absorber materials with low absorption coefficients for the desired spectral range are required. Simulations of C/C multilayers with different period thicknesses, d, and single layer densities, {/content/TMYNX9YD45ALUVEM/xxlarge1009.gif}, show that a reflectance R{/content/TMYNX9YD45ALUVEM/xxlarge8201.gif}([Cu]K{/content/TMYNX9 Y D45ALUVEM/xxlarge945.gif})>80% and a resolving power of about {/content/TMYNX9YD45ALUVEM/xxlarge955.gif}/{/content/TMYNX9YD45ALU V EM/xxlarge916.gif}{/content/TMYNX9YD45ALUVEM/xxlarge955.gif}{/cont e n t/TMYNX9YD45ALUVEM/xxlarge8776.gif}600 can be achieved for C/C layer stacks with d=3 nm and N=1000 periods. |
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ISSN: | 0947-8396 1432-0630 |
DOI: | 10.1007/s00339-003-2623-5 |