Large-area metallic photonic crystal fabrication with interference lithography and dry etching

Large-area one-dimensional periodic metallic structures were fabricated on a waveguide layer with interference lithography and dry etching. As narrow as 115-nm gold nanowires were obtained with a period of 395 nm, covering a homogeneous area as large as 5 X 5 mm. Extinction measurements demonstrate...

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Veröffentlicht in:Applied physics. B, Lasers and optics Lasers and optics, 2005-07, Vol.81 (2-3), p.271-275
Hauptverfasser: Guo, H. C., Nau, D., Radke, A., Zhang, X. P., Stodolka, J., Yang, X. L., Tikhodeev, S. G., Gippius, N. A., Giessen, H.
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Sprache:eng
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Zusammenfassung:Large-area one-dimensional periodic metallic structures were fabricated on a waveguide layer with interference lithography and dry etching. As narrow as 115-nm gold nanowires were obtained with a period of 395 nm, covering a homogeneous area as large as 5 X 5 mm. Extinction measurements demonstrate the strong coupling between waveguide mode and gold-particle plasmon resonance. We demonstrate good agreement with a scattering-matrix theory. The dispersion of the metallic photonic crystals was obtained by angle-resolved measurements. This method represents a simple and low-cost way to fabricate large-area metallic photonic crystals.
ISSN:0946-2171
1432-0649
DOI:10.1007/s00340-005-1817-2