Towards wafer-scale integration of high repetition rate passively mode-locked surface-emitting semiconductor lasers

One of the most application-relevant milestones that remain to be achieved in the field of passively mode-locked surface-emitting semiconductor lasers is the integration of the semiconductor absorber into the gain structure, enabling the realization of ultra-compact high-repetition-rate laser device...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics. B, Lasers and optics Lasers and optics, 2004-12, Vol.79 (8), p.927-932
Hauptverfasser: LORENSER, D, UNOLD, H. J, MAAS, D. J. H. C, ASCHWANDEN, A, GRANGE, R, PASCHOTTA, R, EBLING, D, GINI, E, KELLER, U
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:One of the most application-relevant milestones that remain to be achieved in the field of passively mode-locked surface-emitting semiconductor lasers is the integration of the semiconductor absorber into the gain structure, enabling the realization of ultra-compact high-repetition-rate laser devices suitable for wafer-scale integration. We have recently succeeded in fabricating the key element in this concept, a quantum-dot-based saturable absorber with a very low saturation fluence, which for the first time allows stable mode locking of surface-emitting semiconductor lasers with the same mode areas on gain and absorber. Experimental results at high repetition rates of up to 30 GHz are shown.
ISSN:0946-2171
1432-0649
DOI:10.1007/s00340-004-1675-3