Generic Methods for Micrometer- And Nanometer-Scale Surface Derivatization Based on Photochemical Coupling of Primary Amines to Monolayers of Aryl Azides on Gold and Aluminum Oxide Surfaces
A series of aryl azide terminated thiols and phosphonic acids has been synthesized, and used to prepare self-assembled monolayers on (respectively) gold and aluminum oxide surfaces. The rates of photoactivation were determined using contact angle measurement and X-ray photoelectron spectroscopy (XPS...
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Veröffentlicht in: | Langmuir 2013-01, Vol.29 (4), p.1083-1092 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A series of aryl azide terminated thiols and phosphonic acids has been synthesized, and used to prepare self-assembled monolayers on (respectively) gold and aluminum oxide surfaces. The rates of photoactivation were determined using contact angle measurement and X-ray photoelectron spectroscopy (XPS). The behavior of a diazirine functionalized aryl thiol was also studied. The rates of activation were found to be similar for all five adsorbates. However, the extent of photochemical coupling of a primary amine was significantly greater for the aryl azides than for the diazirine. A range of primary amines was successfully coupled to all of the azides with high yield. Little difference in reactivity was observed following perfluorination of the aromatic ring. Micrometer-scale patterns were fabricated by carrying out exposures of the aryl azide terminated SAMs through a mask submerged under a film of primary amine. Contrasting amines could be introduced to unreacted regions in a subsequent maskless step. A scanning near-field optical microscope was used to fabricate nanopatterns. Exposure of the azides to irradiation at 325 nm in air enabled selective deactivation of azides. The surrounding surface was functionalized with a primary amine in a maskless process; when a protein-resistant oligo(ethylene glycol) functionalized amine was used it was possible to produce protein nanopatterns, by adsorbing protein to features defined using near-field exposure. |
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ISSN: | 0743-7463 1520-5827 |
DOI: | 10.1021/la303746e |