Study on Curing Characteristic of UV Nanoimprint Resist

Study on Curing Characteristic of UV Nanoimprint Resist

Photo polymerization characteristics of UV curable resist in UV nanoimprint lithography are studied on monomer conversion ratio. The monomer conversion ratio is measured by Fourier Transform Infrared Spectroscopy (FT-IR) and polymerization velocity is theoretically investigated. The relation between...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2012/06/26, Vol.25(2), pp.211-216
Hauptverfasser: Suzuki, Ryusuke, Sakai, Nobuji, Ohsaki, Takeshi, Sekiguchi, Atsushi, Kawata, Hiroyuki, Hirai, Yoshihiko
Format: Artikel
Sprache:eng
Schlagworte:
conversion
Conversion ratio
Fluoropolymers
Infrared spectroscopy
modulus
Monomers
Nanocomposites
Nanoimprint
Nanomaterials
Nanostructure
Polymerization
Resist
Resists
time constant
UV curable resist
UV nanoimprint
UV-NIL
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Beschreibung
Zusammenfassung:Photo polymerization characteristics of UV curable resist in UV nanoimprint lithography are studied on monomer conversion ratio. The monomer conversion ratio is measured by Fourier Transform Infrared Spectroscopy (FT-IR) and polymerization velocity is theoretically investigated. The relation between monomer conversion ratio and UV intensity is investigated. Also, dependence of polymerization velocity on resist thickness is discussed. Monomer conversion rate is related to the product of square root of the UV intensity and exposure time. The reaction speed decreases in thin films.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.25.211