Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials
Novel Low Temperature Curable (140 °C) Negative-tone Photo-sensitive Transparent coating was developed by using functional siloxane resin. The functional group in siloxane react by UV exposure to proceed thermal cross linking of silanol by restricting molecular motion of silanol groups. This propert...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2012/06/26, Vol.25(3), pp.349-353 |
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| container_end_page | 353 |
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| container_issue | 3 |
| container_start_page | 349 |
| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 25 |
| creator | Okazawa, Toru Ono, Koichiro Suwa, Mitsuhito |
| description | Novel Low Temperature Curable (140 °C) Negative-tone Photo-sensitive Transparent coating was developed by using functional siloxane resin. The functional group in siloxane react by UV exposure to proceed thermal cross linking of silanol by restricting molecular motion of silanol groups. This property made the functional siloxane coating low temperature curable. On the other hand siloxane without functional group was not observed by this reaction accelerating phenomenon. The functional siloxane base negative photosensitive transparent coating exhibits excellent pencil hardness at low temperature curing, excellent transparency even after high temperature treatment, ideal pattern profile as well as good adhesion to various substrates. The developed material is ideal for application of photo-spacer, an insulator, a protection layer and others of various types of optical devices. |
| doi_str_mv | 10.2494/photopolymer.25.349 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1221871168</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1221871168</sourcerecordid><originalsourceid>FETCH-LOGICAL-c540t-7b6c63e296b27953720dd4dbdc893edef0bd1c597d38e7d726e9fbbe48547dc53</originalsourceid><addsrcrecordid>eNplkEtLw0AUhQdRsFZ_gZss3aTOM8kspfjC-ljU9TCZuWlTkkycmSj996a0FMHVgcv3nQsHoWuCZ5RLftuvXXS9a7Yt-BkVM8blCZqQMdKMsewUTbAkPJWU83N0EcIGY8aEkBP0snA_yRLaHryOg4dkPnhdNpC8wUrH-hvS6DpIPnYP0gBdqHfHZOl1F3rtoYvJq47ga92ES3RWjQFXh5yiz4f75fwpXbw_Ps_vFqkRHMc0LzOTMaAyK2kuBcsptpbb0ppCMrBQ4dISI2RuWQG5zWkGsipL4IXguTWCTdHNvrf37muAEFVbBwNNoztwQ1CEUlLkhGTFiLI9arwLwUOlel-32m8VwWo3nfo7naJCjZuN1sPe2oSoV3B0tI-1aeC_cxCPgFlrr6Bjv-V7gkE</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1221871168</pqid></control><display><type>article</type><title>Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials</title><source>J-STAGE Free</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Free Full-Text Journals in Chemistry</source><creator>Okazawa, Toru ; Ono, Koichiro ; Suwa, Mitsuhito</creator><creatorcontrib>Okazawa, Toru ; Ono, Koichiro ; Suwa, Mitsuhito</creatorcontrib><description>Novel Low Temperature Curable (140 °C) Negative-tone Photo-sensitive Transparent coating was developed by using functional siloxane resin. The functional group in siloxane react by UV exposure to proceed thermal cross linking of silanol by restricting molecular motion of silanol groups. This property made the functional siloxane coating low temperature curable. On the other hand siloxane without functional group was not observed by this reaction accelerating phenomenon. The functional siloxane base negative photosensitive transparent coating exhibits excellent pencil hardness at low temperature curing, excellent transparency even after high temperature treatment, ideal pattern profile as well as good adhesion to various substrates. The developed material is ideal for application of photo-spacer, an insulator, a protection layer and others of various types of optical devices.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.25.349</identifier><language>eng</language><publisher>The Society of Photopolymer Science and Technology(SPST)</publisher><subject>Adhesion ; Coating ; Functional groups ; functional siloxane ; Hardness ; Insulators ; negative-tone ; Pencils ; photosensitive ; Polymers ; Siloxanes</subject><ispartof>Journal of Photopolymer Science and Technology, 2012/06/26, Vol.25(3), pp.349-353</ispartof><rights>2012 The Society of Photopolymer Science and Technology (SPST)</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c540t-7b6c63e296b27953720dd4dbdc893edef0bd1c597d38e7d726e9fbbe48547dc53</citedby><cites>FETCH-LOGICAL-c540t-7b6c63e296b27953720dd4dbdc893edef0bd1c597d38e7d726e9fbbe48547dc53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,1877,27901,27902</link.rule.ids></links><search><creatorcontrib>Okazawa, Toru</creatorcontrib><creatorcontrib>Ono, Koichiro</creatorcontrib><creatorcontrib>Suwa, Mitsuhito</creatorcontrib><title>Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>Novel Low Temperature Curable (140 °C) Negative-tone Photo-sensitive Transparent coating was developed by using functional siloxane resin. The functional group in siloxane react by UV exposure to proceed thermal cross linking of silanol by restricting molecular motion of silanol groups. This property made the functional siloxane coating low temperature curable. On the other hand siloxane without functional group was not observed by this reaction accelerating phenomenon. The functional siloxane base negative photosensitive transparent coating exhibits excellent pencil hardness at low temperature curing, excellent transparency even after high temperature treatment, ideal pattern profile as well as good adhesion to various substrates. The developed material is ideal for application of photo-spacer, an insulator, a protection layer and others of various types of optical devices.</description><subject>Adhesion</subject><subject>Coating</subject><subject>Functional groups</subject><subject>functional siloxane</subject><subject>Hardness</subject><subject>Insulators</subject><subject>negative-tone</subject><subject>Pencils</subject><subject>photosensitive</subject><subject>Polymers</subject><subject>Siloxanes</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNplkEtLw0AUhQdRsFZ_gZss3aTOM8kspfjC-ljU9TCZuWlTkkycmSj996a0FMHVgcv3nQsHoWuCZ5RLftuvXXS9a7Yt-BkVM8blCZqQMdKMsewUTbAkPJWU83N0EcIGY8aEkBP0snA_yRLaHryOg4dkPnhdNpC8wUrH-hvS6DpIPnYP0gBdqHfHZOl1F3rtoYvJq47ga92ES3RWjQFXh5yiz4f75fwpXbw_Ps_vFqkRHMc0LzOTMaAyK2kuBcsptpbb0ppCMrBQ4dISI2RuWQG5zWkGsipL4IXguTWCTdHNvrf37muAEFVbBwNNoztwQ1CEUlLkhGTFiLI9arwLwUOlel-32m8VwWo3nfo7naJCjZuN1sPe2oSoV3B0tI-1aeC_cxCPgFlrr6Bjv-V7gkE</recordid><startdate>20120101</startdate><enddate>20120101</enddate><creator>Okazawa, Toru</creator><creator>Ono, Koichiro</creator><creator>Suwa, Mitsuhito</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20120101</creationdate><title>Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials</title><author>Okazawa, Toru ; Ono, Koichiro ; Suwa, Mitsuhito</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c540t-7b6c63e296b27953720dd4dbdc893edef0bd1c597d38e7d726e9fbbe48547dc53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Adhesion</topic><topic>Coating</topic><topic>Functional groups</topic><topic>functional siloxane</topic><topic>Hardness</topic><topic>Insulators</topic><topic>negative-tone</topic><topic>Pencils</topic><topic>photosensitive</topic><topic>Polymers</topic><topic>Siloxanes</topic><toplevel>online_resources</toplevel><creatorcontrib>Okazawa, Toru</creatorcontrib><creatorcontrib>Ono, Koichiro</creatorcontrib><creatorcontrib>Suwa, Mitsuhito</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Okazawa, Toru</au><au>Ono, Koichiro</au><au>Suwa, Mitsuhito</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2012-01-01</date><risdate>2012</risdate><volume>25</volume><issue>3</issue><spage>349</spage><epage>353</epage><pages>349-353</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>Novel Low Temperature Curable (140 °C) Negative-tone Photo-sensitive Transparent coating was developed by using functional siloxane resin. The functional group in siloxane react by UV exposure to proceed thermal cross linking of silanol by restricting molecular motion of silanol groups. This property made the functional siloxane coating low temperature curable. On the other hand siloxane without functional group was not observed by this reaction accelerating phenomenon. The functional siloxane base negative photosensitive transparent coating exhibits excellent pencil hardness at low temperature curing, excellent transparency even after high temperature treatment, ideal pattern profile as well as good adhesion to various substrates. The developed material is ideal for application of photo-spacer, an insulator, a protection layer and others of various types of optical devices.</abstract><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.25.349</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record> |
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| subjects | Adhesion Coating Functional groups functional siloxane Hardness Insulators negative-tone Pencils photosensitive Polymers Siloxanes |
| title | Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials |
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