Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials

Novel Low Temperature Curable (140 °C) Negative-tone Photo-sensitive Transparent coating was developed by using functional siloxane resin. The functional group in siloxane react by UV exposure to proceed thermal cross linking of silanol by restricting molecular motion of silanol groups. This propert...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2012/06/26, Vol.25(3), pp.349-353
Hauptverfasser: Okazawa, Toru, Ono, Koichiro, Suwa, Mitsuhito
Format: Artikel
Sprache:eng
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Zusammenfassung:Novel Low Temperature Curable (140 °C) Negative-tone Photo-sensitive Transparent coating was developed by using functional siloxane resin. The functional group in siloxane react by UV exposure to proceed thermal cross linking of silanol by restricting molecular motion of silanol groups. This property made the functional siloxane coating low temperature curable. On the other hand siloxane without functional group was not observed by this reaction accelerating phenomenon. The functional siloxane base negative photosensitive transparent coating exhibits excellent pencil hardness at low temperature curing, excellent transparency even after high temperature treatment, ideal pattern profile as well as good adhesion to various substrates. The developed material is ideal for application of photo-spacer, an insulator, a protection layer and others of various types of optical devices.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.25.349