Effect of the plasma surface treatment on an anatase TiO sub(2) film
An anatase TiO sub(2) film has been prepared by plasma surface treatment. TiO sub(2) surface thin film formed by RF reactive ion plating method was bombarded by the Ar/H sub(2)/CH sub(4) mixing plasma. The following properties were changed changed by conducting the plasma surface treatment on an ana...
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Veröffentlicht in: | Journal of materials science. Materials in electronics 2005-10, Vol.16 (10), p.645-648 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | An anatase TiO sub(2) film has been prepared by plasma surface treatment. TiO sub(2) surface thin film formed by RF reactive ion plating method was bombarded by the Ar/H sub(2)/CH sub(4) mixing plasma. The following properties were changed changed by conducting the plasma surface treatment on an anatase TiO sub(2) film: Crystal structure, electroconductivity, chemical composition and optical characteristic. Especially, the absorption edge of a TiO sub(2) thin film that conducted plasma surface treatment shifted to visible light region. Therefore, it was proven that it would be able to absorb the visible light and increase the efficiency of the photocatalytic reaction. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-005-3739-5 |